中国初创公司发布首台EUV光源原型机挑战ASML垄断，但荷兰企业对此进展并不担忧
Chinese Startup Unveils First EUV Light Source Prototype To Challenge ASML’s Monopoly, But Dutch Firm Won’t Be Losing Any Sleep Over This Progress
At the 26th China International Industry Fair in Shanghai, Langdao Silex, a Chinese technology startup, revealed its self-developed EUV light source prototype called the “FlintNano LPP-OXXO.” Being a core component of EUV lithography, the company states that it has secured most core components through independent R&D, with a localization rate of approximately 90%. Hearing this development could signal that China is ready to call it quits on ASML, but here’s why we wouldn’t jump to conclusions. Mass production isn’t expected for the next 3-5 years, and that’s likely an optimistic timeline;…
来源 wccftech.com
同题报道 · 3 篇
- 中国初创公司发布首台EUV光源原型机挑战ASML垄断，但荷兰企业对此进展并不担忧 Chinese Startup Unveils First EUV Light Source Prototype To Challenge ASML’s Monopoly, But Dutch Firm Won’t Be Losing Any Sleep Over This Progress wccftech.com ·
- 中国发布EUV光源原型机，显示ASML垄断地位出现裂痕 China Unveils EUV Light Source Prototype, Signaling Cracks in ASML's Monopoly BigGo Finance ·
- “挑战ASML”，中国公司发布“90%国产化率”的EUV光源原型机 'Challenging ASML,' Chinese Firm Unveils EUV Light Source Prototype with '90% Localization Rate' news.sbs.co.kr · · 首发